ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,778, issued on July 21, was assigned to Inpria Corp. (Corvallis, Ore.). "Gas-based development of organometallic resist in an oxidizing hal... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,779, issued on July 21, was assigned to FUJIFILM Corp. (Tokyo). "Transfer film, manufacturing method of laminate, laminate, and micro LED d... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,780, issued on July 21, was assigned to Ricoh Co. Ltd. (Tokyo). "Curable water-based composition, active-energy-ray-curable water-based com... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,781, issued on July 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Brush polymer, photoresist composition inclu... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,782, issued on July 21, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Resist underlayer film-forming composition comprising fluoroalkyl g... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,783, issued on July 21, was assigned to ZHEJIANG CHEER TECHNOLOGY Co. LTD. (Hangzhou, China). "Immersion liquid supply system and immersion... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,784, issued on July 21, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea). "Irradiating module, and apparatus for treating substrate... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,785, issued on July 21, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Lithography system and methods" was... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,786, issued on July 21, was assigned to Robert Bosch GmbH (Stuttgart, Germany) and Carl Zeiss SMT GmbH (Oberkochen, Germany). "Method for o... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,787, issued on July 21, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Optical proximity correction method, mask ma... Read More